ALD/CVD Precursors
High purity precursors for Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) processes used in semiconductor and advanced electronic devices.
Advanced Precursors for Next-Generation Thin Film Deposition
1Chemtech India Pvt. Ltd. supports semiconductor and advanced electronic material manufacturers through the development, sourcing, scale-up, and commercialization of high-purity ALD/CVD precursor materials. Our portfolio includes silicon-based Low-K precursors, metal-based High-K precursors, and specialty ligands for advanced thin-film deposition processes.
The 1Chemtech India technical team continuously follows developments in ALD, ALE, and CVD technologies through technical publications, industry seminars, and scientific collaborations to support the development of next-generation precursor chemistries. Based on customer requirements, we also support the development of novel ligands and customized precursor building blocks.
Our Capabilities
Semiconductor Materials
High purity materials for advanced semiconductor applications.
Low-K & High-K Precursors
Silicon-based and metal-based precursors for thin film deposition.
Novel Ligand Development
Custom ligand synthesis and new precursor development.
Scale-Up & Commercial Supply
From lab-scale to bulk supply with consistent quality and reliability.
Global Technical Collaboration
Technical partnerships and knowledge sharing for advanced materials.
High Purity & Quality Assured
Stringent quality control ensuring high purity and excellent performance.
Low-K Precursors
Silicon-based and organosilicon precursor materials for advanced dielectric and semiconductor applications.
High-K Precursors
Metal-organic precursor materials for advanced dielectric, memory, and semiconductor device applications.
Ligands
Amine ligands, Cp ligands, and customized ligand systems supporting precursor development and advanced material research.